| The Secondary-Ion Analysis of n-Type Bi2Te2.85Se0.15 Sintering Alloy. (1998) | |||||||||
Abstract | |||||||||
| N-type doping by SbI3 has been used to study the influence of sintering by secondary-ion mass spectrometry (SIMS); the SbI3-doped Bi2Te2.85Se0.15 alloys were melted in 1 atm argon atmosphere at 800 C for 3 to 5h; after homogeneous melting the alloys were cooled slowly and crushed in a stamp mill in non-volatile atmosphere; they were then sifted into about 50 to 250 micrometers; the powders thus prepared for sintering were hot-pressed at 300 to 500 C under 300 kg(f)square cm for 1h; the samples were cut into the form of small platelets with the dimensions 5mm X 15mm X 3mm; measurements were made on these samples after polishing; after dry evacuation of the system at 0.000003 the SIMS was taken using a Hitachi IMA-2AS system by irradiating with Ar(+) (10 kV, 0.06 microamperes) as the primary ion; the primary-ion beam was focused on the samples to a diameter of 250 microns and, after ion etching for 30 min, the secondary ions of oxygen, TeO(sub x), BiO(sub y), and so on, were detected. | |||||||||
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