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Controlled Graft Polymerization on Silicon Substrate by the Combined Use of the Langmuir-Blodgett and Atom Transfer Radical Polymerization Techniques (ORGANIC MATERIALS CHEMISTRY-Polymeric Materials) (1998)

Abstract
The atom transfer radical polymerization technique using the copper/ligand complexes was applied to the graft polymerization of methyl methacrylate on the Si wafer on which the monolayer of the initiator, 2-(4-chlorosulfonylphenyl) ethyl trimethoxysilane, was immobilized by the Langmuir- Blodgett technique. Atomic force microscopic and ellipsometric studies revealed that the polymerization with an additional initiator afforded a homogeneous graft layer, the thickness of which increased proportionally to the number-average molecular weight of the narrow-polydispersity homopolymers produced in the solution. This suggests that the graft polymerization is successfully controlled by the Cu/ligand complexes in the same way as the solution polymerization.

Publication details
Download http://hdl.handle.net/2433/65153
Publisher Institute for Chemical Research, Kyoto University
Repository Kyoto University Research Information Repository (KURENAI) (Japan)
Keywords Surface modification, Monolayer, Immobilization, Controlled radical polymerization, Graft layer, Ellipsometry, 430
Type Article
Language English