Andrea Orzati

One-Step Patterning of Asymmetric Gate Recess for InP HEMTs using Genetic Algorithms (2008)

Franck Robin, Andrea Orzati, Esteban Moreno, Michael Spühler, Otte Homan, Werner Bächtold

For the first time, a canonical genetic algorithm was used to optimize the resist profiles for T-gate fabrication. An e-beam lithography simulation tool was elaborated that calculates the...

Simulation and Evolutionary Optimization of Electron-Beam Lithography with Genetic and Simplex-Downhill Algorithms (2003)

Franck Robin, Andrea Orzati, Student Member, Esteban Moreno, Otte J. Homan, Werner Bächtold

Genetic and simplex-downhill (SD) algorithms were used for the optimization of the electron-beam lithography (EBL) step in the fabrication of microwave electronic circuits. The definition of...