D. Levchuk

Publication List Details

Period

2003 - 2009

Number

52

Co-Authors

Crystal structure characterisation of filtered arc deposited alumina coatings: temperature and bias voltage (2003)

Brill,R., Koch,F., Mazurelle,J., Levchuk,D., Balden,M., Yamada-Takamura,Y., ...

Using a filtered vacuum arc deposition device, stoichiometric aluminum oxide (Al₂O₃) films, with thickness ranging from 20 nm to several microns, were produced under various substrate bias...

Crystal structure characterisation of filtered arc deposited alumina coatings: temperature and bias voltage (2003)

Brill, R., Koch, F., Mazurelle, J., Levchuk, D., Balden, M., Yamada-Takamura, Y., ...

Using a filtered vacuum arc deposition device, stoichiometric aluminum oxide (Al₂O₃) films, with thickness ranging from 20 nm to several microns, were produced under various substrate bias...