Biocidal Silver and Silver/Titania Composite Films Grown by Chemical Vapour Deposition (2008)
D. W. Sheel, L. A. Brook, I. B. Ditta, P. Evans, H. A. Foster, A. Steele, ...
This paper describes the growth and testing of highly active biocidal films based on photocatalytically active films of TiO2, grown by thermal CVD, functionally and structurally modified by...
Atmospheric pressure plasmas for crystalline silicon photovoltaics (2008)
Hopfe, V., Sheel, D.W., Möller, R.
Plasma processing at atmospheric pressure (APP) has attractions for both economic and technological reasons. Potential cost saving factors are associated with on-line processing capability, which...
Biocidal Silver and Silver/Titania Composite Films Grown by Chemical Vapour Deposition (2008)
D. W. Sheel, L. A. Brook, I. B. Ditta, P. Evans, H. A. Foster, A. Steele, ...
This paper describes the growth and testing of highly active biocidal films based on photocatalytically active films of TiO2, grown by thermal CVD, functionally and structurally modified by...
Atmospheric-pressure PECVD coating and plasma chemical etching for continuous processing (2007)
Plasma processing at atmospheric pressure (APPlasmas) has attractions for both economic and technological reasons. Potential costs-saving factors are associated with online-processing capability and...
Atmospheric-pressure plasmas for wide-area thin-film deposition and etching (2007)
The present paper is focused on coating technologies compatible with industrial requirements, particularly on atmospheric pressure plasma technologies which are compatible with scaling to wide...
In-situ monitoring for CVD processes (2003)
Hopfe, V., Sheel, D.W., Tell, R., Martin, P., Beil, A., ...
Aiming towards process control of industrial high yieldyhigh volume CVD reactors, the potential of optical sensors as a monitoring tool has been explored. The sensors selected are based on both...
In-situ monitoring for CVD processes (2002)
Hopfe, V., Sheel, D.W., Tell, R., Martin, P., Beil, A., ...
Aiming toward process control of industrial high yield / high volume CVD reactors, the potential of optical sensors as a monitoring tool has been explored. The sensors selected are based on both...
Prozessüberwachung industrieller CVD-Beschichtungsanlagen mittels NIR-DLS- und FTIR-Sensorik (2002)
Hopfe, V., Sheel, D.W., Grählert, W., Raisbeck, D., Rivero, J.M., Throl, O.
An efficient process control is essential to fully exploit the potential of high yield CVD (Chemical vapour deposition) processes which are key technologies in many industrial sectors. Reactor...
NIR diode laser based process control for industrial CVD reactors (2001)
Hopfe, V., Sheel, D.W., Raisbeck, D., Rivero, J.M., Graehlert, W., Throl, O., ...
The proposed new technical approach for CVD process control is characterised by a chemistry based feedback system with in-situ optical data as input information. The selected optical sensors...
NIR Diode Laser Based Process Control for Industrial CVD Reactors (2001)
Hopfe, V., Sheel, D.W., Raisbeck, D., Rivero, J.M., Graehlert, W., Throl, O., ...
The proposed new technical approach for CVD process control is characterised by a chemistry based feedback system with in-situ optical data as input information. The selected optical sensors...
FTIR monitoring of industrial scale CVD processes (1998)
Hopfe, V., Mosebach, H., Meyer, M., Sheel, D.W., Grählert, W., Throl, O., ...
Chemical vapour deposition (CVD) as well as infiltration (CVI) processes are key technologies in many industrial sectors, including extensive use in micro electronics, surface protection of...