Tada, Yasuhiko, Akasaka, Satoshi, Yoshida, Hiroshi, Hasegawa, Hirokazu, Dobisz, Elizabeth, Kercher, Dan, ...
Anti-Charging Layers for Beam Lithograpghy and Mask Fabrication (1998)
This invention discloses an anti-charging layer for beam lithography and mask fabrication. This invention reduces beam displacement and increases pattern placement accuracy. The process will be used...