Plasma charging damage reduction in IC processing by a self-balancing interconnect (2004)
Wang, Zhiming; U0042846, Ackaert, J, Salm, C, Kuper, FG, De Backer, E
In this paper, a novel first order self-balancing interconnect layout design is proposed for reducing plasma-process induced charging damage (P2ID) in modern CMOS processes. According to the...
Plasma-charging damage of floating MIM capacitors (2004)
Wang, ZC, Ackaert, J, Salm, C, Kuper, FG, Tack, Michaël; U0044150, De Backer, E, ...
In this paper, the mechanism of plasma-charging damage (PCD) of metal-insulator-metal (MIM) capacitors as well as possible protection schemes are discussed. A range of test structures with different...