One-Step Patterning of Asymmetric Gate Recess for InP HEMTs using Genetic Algorithms (2008)
Franck Robin, Andrea Orzati, Esteban Moreno, Michael Spühler, Otte Homan, Werner Bächtold
For the first time, a canonical genetic algorithm was used to optimize the resist profiles for T-gate fabrication. An e-beam lithography simulation tool was elaborated that calculates the...
Metal direct nanoimprinting for photonics (2008)
Buzzi, Stefano, Robin, Franck, Callegari, Victor, Loeffler, Jorg F.
In this paper metal direct nanoimprinting (embossing) for the production of metallic microparts is discussed, with a main focus on its suitability for the fabrication of metal-containing optical...
Franck Robin, Andrea Orzati, Student Member, Esteban Moreno, Otte J. Homan, Werner Bächtold
Genetic and simplex-downhill (SD) algorithms were used for the optimization of the electron-beam lithography (EBL) step in the fabrication of microwave electronic circuits. The definition of...
Diss. no. 14849 techn. sc. SFIT Zurich.
Further Development of Artificial Pancreas: Blocked by Patents?
Erdin, Nils, Robin, Franck, Heinemann, Lutz, Brandt, Derek, Hovorka, Roman
Patent activity in the field of medical device technology and especially in the area of artificial pancreas development has surged in recent years. According to the search presented in this article,...