G. Schlaghecken

Publication List Details

Period

1999 - 2004

Number

7

Co-Authors

Pulsed laser deposition of Er:BaTiO3 for planar waveguides (2004)

Schlaghecken, G., Gottmann, J., Kreutz, E.W., Poprawe, R.

Laser radiation is used for the deposition of dielectric erbium doped BaTiO3 thin films for photonic applications. Pulsed laser deposition with KrF excimer laser radiation (wavelength 248 nm, pulse...

Model for the expansion dynamics of the laser-induced plasma and fabrication of erbium doped planar waveguides by pulsed laser deposition and laser micromachining for up-conversion applications (2004)

Gottmann, J., Schlaghecken, G., Kreutz, E.W.

The dynamics of the laser induced plasma during pulsed laser deposition of BaTiO3 thin films is studied theoretically and experimentally and related to the resulting film properties. The expansion of...

Fabrication of erbium doped planar waveguides by pulsed laser deposition and laser micromachining (2003)

Gottmann, J., Schlaghecken, G., Wagner, R., Kreutz, E.W.

Laser radiation is used both for the deposition of dielectric Er:BaTi03 thin films and for material removal to generate wave guiding structures for photonic applications. Pulsed laser deposition with...

Pulsed laser deposition of diamond like carbon (DLC) and zirconia-tougened alumina (ZTA) on steels and PMMA (2002)

Perera, Y., Schlaghecken, G., Gottmann, J., Kreutz, E.W., Poprawe, R.

Pulsed laser deposition (PLD) has been carried out with KrF-excimer laser radiation (lambda(L) = 248 nm, tau(L) = 25 ns). The investigations are focused on the adherence of the diamond like carbon...

Pulsed laser deposition (PLD) of diamond-like carbon (DLC) thin film on Polymethylmethacrylate (PMMA) and tool steels (2001)

Perera, Y., Schlaghecken, G., Gottmann, J., Klotzbücher, T., Kreutz, E.W., Poprawe, R.

Pulsed laser deposition with KrF-excimer laser radiation (lambda = 248 nm; t = 25 ns) is used to grow diamond like carbon (DLC) thin films on PMMA and tool steel substrates. The investigations are...

Determining the properties of pulsed laser deposited thin films by controlling the kinetic energy of the film-forming particles (1999)

Gottmann, J., Schlaghecken, G., Kreutz, E.W.

The deposition of Al2O3 thin films by pulsed KrF excimer laser radiation (248nm) on fused silicia substrates is investigated as a function of the processing variables: laser fluence, processing gas...