Pulsed laser deposition of Er:BaTiO3 for planar waveguides (2004)
Schlaghecken, G., Gottmann, J., Kreutz, E.W., Poprawe, R.
Laser radiation is used for the deposition of dielectric erbium doped BaTiO3 thin films for photonic applications. Pulsed laser deposition with KrF excimer laser radiation (wavelength 248 nm, pulse...
Gottmann, J., Schlaghecken, G., Kreutz, E.W.
The dynamics of the laser induced plasma during pulsed laser deposition of BaTiO3 thin films is studied theoretically and experimentally and related to the resulting film properties. The expansion of...
Gottmann, J., Schlaghecken, G., Wagner, R., Kreutz, E.W.
Laser radiation is used both for the deposition of dielectric Er:BaTi03 thin films and for material removal to generate wave guiding structures for photonic applications. Pulsed laser deposition with...
Laser-assisted surface microstructuring of ME/ZrO2 bilayered thin-film system (2003)
Starbova, K., Krumov, E., Radoeva, M., Starbov, N., Popov, D., Schlaghecken, G., ...
Perera, Y., Schlaghecken, G., Gottmann, J., Kreutz, E.W., Poprawe, R.
Pulsed laser deposition (PLD) has been carried out with KrF-excimer laser radiation (lambda(L) = 248 nm, tau(L) = 25 ns). The investigations are focused on the adherence of the diamond like carbon...
Perera, Y., Schlaghecken, G., Gottmann, J., Klotzbücher, T., Kreutz, E.W., Poprawe, R.
Pulsed laser deposition with KrF-excimer laser radiation (lambda = 248 nm; t = 25 ns) is used to grow diamond like carbon (DLC) thin films on PMMA and tool steel substrates. The investigations are...
Gottmann, J., Schlaghecken, G., Kreutz, E.W.
The deposition of Al2O3 thin films by pulsed KrF excimer laser radiation (248nm) on fused silicia substrates is investigated as a function of the processing variables: laser fluence, processing gas...