A comparative study of reactive direct current magnetron sputtered CrAlN and CrN coatings (2006)
Barshilia, Harish C, Selvakumar, N, Deepthi, B, Rajam, KS
Approximately 1.5 μm thick CrN and CrAlN coatings were deposited on silicon and mild steel substrates by reactive direct current (DC) magnetron sputtering. The structural and mechanical properties...
Barshilia, Harish C, Deepthi, B, Rajam, KS
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using reactive direct current (DC) unbalanced magnetron sputtering. The Si and TiAl targets were...
Reactive sputtering of hard nitride coatings using asymmetric-bipolar pulsed DC generator (2006)
Barshilia, Harish C, Rajam, KS
Hard coatings of TiN, CrN, TiAlN and Si3N4, which exhibit a large variation in their electrical resistivities, have been prepared in an unbalanced magnetron sputtering system using an...
Barshilia, Harish C, Deepthi, B, Prabhu, ASA, Rajam, KS
Approximately 1.5-μm-thick superhard nanocomposite coatings of TiN/Si3N4 with varying silicon contents were deposited on silicon and stainless steel (SS 304) substrates by reactive direct current...
William Grips, VK, Barshilia, Harish C, Ezhil Selvi, V, Rajam, KS
The corrosion behaviors of single layer TiN, CrN, TiAlN and multilayer TiAlN/CrN coatings, deposited on steel substrate using a multi-target reactive direct current magnetron sputtering process, were...
Barshilia, Harish C, Rajam, KS, Anjana, Jain, Gopinadhan, K, Chaudhary, Sujeet
Nanolayered multilayer coatings of TiN/NbN and TiAlN/TiN were deposited on Si (100) substrates at various modulation wavelengths (i.e.bilayer thickness, K) using a reactive direct current magnetron...
Tiaintiaion Si3 N4 tandem absorber for high temperature solar selective applications (2006)
Barshilia, Harish C, Selvakumar, N, Rajam, KS, Rao, Sridhara DV, Muraleedharan, K, Biswas, A
A tandem absorber of Titainion Si3 N4 is prepared using a magnetron sputtering process. The graded composition of the individual component layers of the tandem absorber produces a film with a...
William Grips, VK, Ezhil Selvi, V, Barshilia, Harish C, Rajam, KS
The electrochemical behavior of single layer TiN, CrN, TiAlN and multilayer TiAlN/CrN coatings, deposited on steel substrates using a multi-target reactive direct current (dc) magnetron sputtering...
Barshilia, Harish C, Rajam, KS
Nanolayered multilayer coatings of TiAlN/TiN and TiN/NbN were deposited on Si (100) substrates at various modulation wavelengths (i.e., bilayer thickness,A) using a reactive dc magnetron sputtering...
Barshilia, Harish C, Rajam, KS, Sridhara Rao, DV
Multilayer coatings of TiN/NbN with a modulation wavelength of about 8 nm were prepared on silicon (100) and tool steel substrates at low deposition temperature (approximately 100 °C) using a...
Barshilia, Harish C, Rajam, KS, Jain, Anjana, Gopinadhan, K, Chaudhary, Sujeet
Nanolayered multilayer coatings of TiN/NbN and TiAlN/TiN were deposited on Si (100) substrates at various modulation wavelengths (i.e.bilayer thickness, K) using a reactive direct current magnetron...
Structure, hardness and thermal stability of TiAlN and nanolayered TiAlN/CrN multilayer films (2005)
Barshilia, Harish C, Surya Prakasha, M, Jain, Anjana, Rajam, KS
TiAlN films were deposited on silicon (1 1 1) substrates from a TiAl target using a reactive DC magnetron sputtering process in Ar+N2 plasma. Films were prepared at various nitrogen flow rates and...
Superhard nanocomposite coatings of TiN/a-C prepared by reactive DC magnetron sputtering (2004)
Barshilia, Harish C, Surya Prakash, M, Sridhara Rao, DV, Rajam, KS
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC magnetron sputtering process at various nitrogen flow rates and substrate biases. TiN coatings...
Structure, hardness and thermal stability of TiAlN and nanolayered TiAlN/CrN multilayer films (2004)
Barshilia, Harish C, Surya Prakash, M, Anjana, Jain, Rajam, KS
TiAlN films were deposited on silicon (1 1 1) substrates from a TiAl target using a reactive DC magnetron sputtering process in Ar+N2 plasma. Films were prepared at various nitrogen flow rates and...
Barshilia, Harish C, Surya Prakash, M, Aithu, Poojari, Rajam, KS
Nanocomposite coatings of TiN/a-C were prepared on tool steel substrates using a multitarget reactive DC magnetron sputtering process at various TiN layer thicknesses (0.6–2.8 nm). The a-C layer...
Barshilia, Harish C, Rajam, KS
About 1.5-um-thick single-layer TiN, CrN, TiAlN coatings and nanolayered TiN/CrN, TiAlN/CrN multilayer coatings were deposited on silicon (111) substrates using a reactive direct current magnetron...
Nanoindentation and atomic force microscopy measurements on reactively sputtered TiN coatings (2004)
Barshilia, Harish C, Rajam, KS
Titanium nitride (TiN) coatings were deposited by d.c. reactive magnetron sputtering process. The films were deposited on silicon (111) substrates at various process conditions, e.g. substrate bias...
Barshilia, Harish C, Surya Prakash, M, Aithu, Poojari, Rajam, KS
TiN, NbN and TiN/NbN multilayer coatings were deposited on tool steel substrates using a reactive DC magnetron sputtering process. The coatings were characterized using X-ray diffraction,...
Barshilia, Harish C, Prakash, MS, Poojari, A, Rajam, KS
TiN, NbN and TiN/NbN multilayer coatings were deposited on tool steel substrates using a reactive DC magnetron sputtering process. The coatings were characterized using X-ray diffraction,...
Structure and properties of reactive DC magnetron sputtered TiN/NbN hard superlattices (2004)
Barshilia, Harish C, Rajam, KS
Nanostructured TiN/NbN superlattices at various modulation wavelengths (?) were deposited on silicon (111) and tool steel substrates using a reactive DC magnetron sputtering process. Structural...
Nanoindentation and atomic force microscopy measurements on reactively sputtered TiN coatings (2004)
Barshilia, Harish C, Rajam, KS
Titanium nitride (TiN) coatings were deposited by d.c. reactive magnetron sputtering process. The films were deposited on silicon (111) substrates at various process conditions, e.g. substrate bias...
Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering (2003)
Barshilia, Harish C, Rajam, KS
Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a reactive d.c. magnetron sputtering process. Superlattice period, also known as modulation wavelength (?), was...
Structure, hardness and thermal stability of nanolayered TiN/CrN multilayer coatings (2003)
Barshilia, Harish C, Rajam, KS, Jain, Anjana
Nanolayered TiN/CrN multilayer coatings were deposited on silicon substrates using a reactive DC magnetron sputtering process at various modulation wavelengths (?), substrate biases (VB) and...
Structure, hardness and thermal stability of nanolayered TiN/CrN multilayer coatings (2003)
Barshilia, Harish C, Rajam, KS, Jain, Anjana
Nanolayered TiN/CrN multilayer coatings were deposited on silicon substrates using a reactive DC magnetron sputtering process at various modulation wavelengths (?), substrate biases (VB) and...
Deposition of TiN/CrN hard superlattices by reactive d.c. magnetron sputtering (2003)
Barshilia, Harish C, Rajam, KS
Multilayer superlattice coatings of TiN/CrN were deposited on silicon substrates using a reactive d.c. magnetron sputtering process. Superlattice period, also known as modulation wavelength (L), was...
Nanolayered TiN/NbN Multilayers as New Superhard Materials (2003)
Barshilia, Harish C, Rajam, KS
Nanolayered multilayer coatings of TiN/NbN on silicon and tool steel substrates were deposited using a reactive DC magnetron sputtering process. Judicious control of process parameters enabled the...
Characterization of CuyNi multilayer coatings by nanoindentation and atomic force microscopy (2002)
Barshilia, Harish C, Rajam, KS
Cu/Ni multilayer coatings prepared by RF/DC magnetron sputtering process were characterized using x-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) techniques. Films...
Characterization of Cu/Ni multilayer coatings by nanoindentation and atomic force microscopy (2002)
Barshilia, Harish C, Rajam, KS
Cu/Ni multilayer coatings prepared by RF/DC magnetron sputtering process were characterized using x-ray diffraction (XRD), nanoindentation and atomic force microscopy (AFM) techniques. Films...