J. Heitmann

Publication List Details

Period

2002 - 2009

Number

34

Co-Authors

Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2-x thin films using tunneling atomic force microscopy (2009)

Weinreich, W., Wilde, L., Kücher, P., Lemberger, M., Yanev, V., Rommel, M., ...

Tunneling atomic force microscopy \'01TUNA\'02 is used to identify leakage current characteristics in SiO2 doped ZrO2 thin films within the nanometer scale. TUNA current maps and local TUNA I-V...

Impact of interface variations on J-V and C-V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1-x)AlxO2 films (2009)

Weinreich, W., Reiche, R., Lemberger, M., Jegert, G., Müller, J., Wilde, L., ...

Polarity asymmetries in JSV and CSV characteristics of symmetrical MIM capacitors with amorphous and crystalline Zr(1\'02x)AlxO2 films and TiN electrodes are evaluated. Physical analysis of the...

Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers (2009)

Weinreich, W., Ignatova, V.A., Wilde, L., Teichert, S., Lemberger, M., Bauer, A.J., ...

The influence of the annealing atmosphere and temperature on the crystalline phase and composition of thin ZrO2 layers grown by atomic layer deposition on silicon is analyzed. These physical...

Deposition temperature effect on electrical properties and interface of high-k ZrO2 capacitor (2008)

Ignatova, V.A., Heitmann, J., Oberbeck, L.

The electrical characteristics, i.e. leakage current and capacitance, of ZrO2 based metal-insulator-metal structures, grown at 225, 250 and 275 degrees C by atomic layer deposition, were studied. The...

Physical and electrical characterization of high-k ZrO2 metal-insulator-metal capacitor (2008)

Ignatova, V.A., Kücher, P., Heitmann, J., Oberbeck, L., Schröder, U.

The effect of the deposition temp. and layer thickness on the phys. and elec. properties of ZrO2-based high-k metal-insulator-metal (MIM) capacitors was studied. The increasing thickness of ZrO2...

Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics (2008)

Yanev, V., Rommel, M., Lemberger, M., Petersen, S., Amon, B., Erlbacher, T., ...

High-k dielectric layers (HfSixOy and ZrO2) with different film morphologies were investigated by tunneling atomic-force microscopy (TUNA). Different current distributions were observed for amorphous...

Excitons in Si nanocrystals: Confinement and migration effects (2004)

Heitmann, J., Muller, F., Yi, L. X., Zacharias, M., Kovalev, D., Eichhorn, F.

A detailed analysis of the strong room-temperature photoluminescence (PL) signal of size controlled nc-Si is reported. The size control of nc-Si is realized by evaporation of SiO/SiO2 superlattices...

Pathogenicity of Spiroplasma sp. strain SMCA in rabbits: clinical, microbiological, and histological aspects.

Kirchhoff, H, Heitmann, J, Trautwein, G

Newborn rabbits inoculated intracerebrally with early-passaged broth cultures of Spiroplasma strain SMCA (suckling mouse cataract agent) either died or developed eye disease. Death occurred 4 to 12...

Pathogenicity of Spiroplasma sp. strain SMCA in rabbits: clinical, microbiological, and histological aspects.

Kirchhoff, H, Heitmann, J, Trautwein, G

Newborn rabbits inoculated intracerebrally with early-passaged broth cultures of Spiroplasma strain SMCA (suckling mouse cataract agent) either died or developed eye disease. Death occurred 4 to 12...