J. P. Conde

Annealing kinetics of a-Si:H deposited by concentric-electrode rf glow discharge at room temperature (2008)

Conde, J. P., Chan, K. K., Blum, J. M., Arienzo, M., Monteiro, P. A., Ferreira, J. A., ...

The irreversible isothermal annealing of the as-deposited defects of hydrogenated amorphous silicon, a-Si:H, deposited at room temperature by concentric-electrode radio-frequency glow discharge is...

Annealing kinetics of a-Si:H deposited by concentric-electrode rf glow discharge at room temperature (2008)

Conde, J. P., Chan, K. K., Blum, J. M., Arienzo, M., Monteiro, P. A., Ferreira, J. A., ...

The irreversible isothermal annealing of the as-deposited defects of hydrogenated amorphous silicon, a-Si:H, deposited at room temperature by concentric-electrode radio-frequency glow discharge is...

Electronic and structural properties of doped amorphous and nanocrystalline silicon deposited at low substrate temperatures by radio-frequency plasma-enhanced chemical vapor deposition (2003)

Alpuim, P., Chu, V., Conde, J. P.

The gas phase doping of hydrogenated amorphous silicon and hydrogenated nanocrystalline silicon thin films deposited on glass and on plastic (polyethylene terephthalate) substrates is reported. Two...

Electronic transport in low-temperature silicon nitride (2002)

Alpuim, P., Ferreira, P., Chu, V., Conde, J. P.

Perpendicular current transport through thin silicon nitride films deposited at 100 degreesC by radio frequency chemical vapor deposition (RF) is measured between patterned square contacts with side...

Doping of amorphous and microcrystalline silicon films deposited at low substrate temperatures by hot-wire chemical vapor deposition (2001)

Alpuim, P., Chu, V, Conde, J. P.

The gas phase doping of amorphous (alpha -Si:H) and microcrystalline (muc-Si:H) silicon thin films deposited at substrate temperatures of 25 degreesC and 100 degreesC by hot-wire chemical vapor...

Low substrate temperature deposition of amorphous and microcrystalline silicon films on plastic substrates by hot-wire chemical vapor deposition (1999)

Alpuim, P., Chu, V., Conde, J. P.

Amorphous and microcrystalline silicon films were deposited by radio-frequency plasma enhanced chemical vapor deposition (rf-PECVD) and hot-wire chemical Vapor deposition (HW-CVD) on plastic...

Role of RF power and gas mixture in some optical and photoluminescence properties of dual-plasma a-C:H films (1998)

Heitz, T., Godet, C., Bouree, J.E., Drevillon, B., Chu, V., Conde, J.P., ...

Role of RF power and gas mixture in some optical and photoluminescence properties of dual-plasma a-C:H films (1998)

Heitz, T., Godet, C., Bouree, J.E., Drevillon, B., Chu, V., Conde, J.P., ...

An on-chip thin film photodetector for the quantification of DNA probes and targets in microarrays

Fixe, F., Chu, V., Prazeres, D. M. F., Conde, J. P.

A flat microdevice which incorporates a thin-film amorphous silicon (a-Si:H) photodetector with an upper layer of functionalized SiO2 is used to quantify the density of both immobilized and...

An on-chip thin film photodetector for the quantification of DNA probes and targets in microarrays

Fixe, F., Chu, V., Prazeres, D. M. F., Conde, J. P.

A flat microdevice which incorporates a thin-film amorphous silicon (a-Si:H) photodetector with an upper layer of functionalized SiO2 is used to quantify the density of both immobilized and...