A versatile surface channel concept for microfluidic applications (2007)
Dijkstra, M., Boer De, M.J., Berenschot, J.W., Lammerink, T.S.J., Wiegerink, R.J., Elwenspoek, M.
MEMS fluidic devices often require the integration of transducer structures with freely suspended microchannels. In this paper a versatile microchannel fabrication concept is presented, allowing for...
Bruinink, C.M., Peter, M., Maury, P.A., Boer De, M.J., Kuipers, L., Huskens, J., ...
The implementation of high-resolution polymer templates fabricated by capillary force lithography (CFL) is explored both in nanoimprint lithography (NIL) and in the wet-etching of metals. Several...
Deladi, S., Tas, N.R., Berenschot, J.W., Boer De, J.H., Boer De, M.J., Krijnen, G.J.M., ...
We present a device that enables nanoelectrochemical deposition using atomic force microscope. The micromachined fountain pen is a probe that consists of a fluidic reservoir, fluidic channels...
Deladi, S., Tas, N.R., Berenschot, J.W., Boer De, M.J., Krijnen, G.J.M., Elwenspoek, M.C.
We present a device that enables nanoelectrochemical deposition using Atomic Force Microscope. The micromachined fountain pen is a probe that consists of a fluidic reservoir, fluidic channels...
In situ characterization technique for nanotribological investigations (2005)
Deladi, S., Berenschot, J.W., Boer De, M.J., Krijnen, G.J.M., Tas, N.R., Elwenspoek, M.C.
An innovative technique has been developed to enable in situ monitoring of mechanical surface modification. The method is based on using a test surface and a sharp tip located on two different...
Deladi, S., Berenschot, J.W., Tas, N.R., Boer De, J.H., Boer De, M.J., Krijnen, G.J.M., ...
We present the fabrication process of a tool that can be used in standard atomic force microscope (AFM) for in situ characterization of chemical, chemical¿mechanical or physical surface modification...
Sarajlic, E., Boer De, M.J., Jansen, H.V., Arnal, N., Puech, M., Krijnen, G.J.M., ...
We present a bulk micromachining technology, based on vertical trench isolation, for fabrication of two-level MEMS in a standard monocrystalline silicon substrate. The technology, suitable for full...
An AFM-based device for in-situ characterization of nano-wear (2004)
Deladi, S., Berenschot, J.W., Boer De, M.J., Krijnen, G.J.M., Elwenspoek, M.C.
An innovative tool has been developed to investigate in-situ monitoring of surface modification, which can be used in standard Atomic Force Microscopes (AFM). The device enables detection of...
Micromachined fountain pen for atomic force microscope based nanopatterning (2004)
Deladi, S., Tas, N.R., Berenschot, J.W., Krijnen, G.J.M., Boer De, M.J., Boer De, J.H., ...
We present a tool that can be used in standard atomic force microscope and that enables chemical, chemical/mechanical, or physical surface modification using continuous liquid supply. The device...
Sarajlic, E., Boer De, M.J., Jansen, H.V., Arnal, N., Puech, M., Krijnen, G., ...
A bulk micromachining technology for fabrication of micro electro mechanical systems (MEMS) in a standard silicon wafer is presented. A fabrication process, suitable for full integration with on-chip...
Innovative process development for a new micro-tribosensor using surface micromachining (2003)
Deladi, S., Boer De, M.J., Krijnen, G.J.M., Rosen, D., Elwenspoek, M.C.
We present a study on thick Si-rich nitride/polycrystalline Si/silicon oxide multilayer-stacks made by LPCVD and PECVD techniques. The pattern transfer into the multilayer-stacks is achieved by dry...
Tong, D.H., Gielens, F.C., Berenschot, J.W., Boer De, M.J., Gardeniers, J.G.E., ...
A thin but strong and defect free palladium-silver (Pd-Ag) alloy membrane is fabricated with a sequence of well-known thin film and micromachining techniques. A microfabrication process also creates...
Studies of AIN growth on various substrates by RF reactive sputtering techniques (2003)
Saravanan, S., Berenschot, J.W., Boer De, M.J., Krijnen, G.J.M., Elwenspoek, M.C.
Microfabrication of palladium-silver alloy membranes for hydrogen separation (2003)
Tong, D.H., Berenschot, J.W., Boer De, M.J., Gardeniers, J.G.E., Wensink, H., Jansen, H.V., ...
In this paper, a process for the microfabrication of a wafer-scale palladium-silver alloy membrane (Pd-Ag) is presented. Pd-Ag alloy films containing 23 wt% Ag were prepared by co-sputtering from...
Silicon micromachined hollow microneedles for transdermal liquid transfer (2002)
Gardeniers, J.G.E., Berenschot, J.W., Boer De, M.J., Yeshurun, Y., Hefetz, M., ...
This paper presents an improved design and fabrication process [ 13 for hollow micro needles with the proper mechanical strength and sharpness to be applied for painless transdermal transfer of...
Micromachined palladium silver alloy membranes for hydrogen separation (2002)
Tong, D.H., Gielens, F.C., Berenschot, J.W., Boer De, M.J., Gardeniers, J.G.E., Jansen, H.V., ...
This paper presents wafer-scale palladium - silver alloy membranes, fabricated with a sequence of wellknown thin film and silicon micromachining techniques. The membranes have been tested in a gas...
Tong, D.H., Gielens, F.C., Berenschot, J.W., Boer De, M.J., Gardeniers, J.G.E., Nijdam, W., ...
In this paper, a MEMS based wafer-scale palladium-silver alloy membrane (MWSPdAgM) is presented. This membrane has the potential to be used for hydrogen purification and other applications. A...
Boer De, M.J., Gardeniers, J.G.E., Jansen, H.V., Gilde, M.J., Roelofs, G., Sasserath, J.N., ...
This paper presents guidelines for the deep reactive ion etching (DRIE) of silicon MEMS structures, employing SF/sub 6//O/sub 2/-based high-density plasmas at cryogenic temperatures. Procedures of...
Rusu, C., Boer De, M.J., Jansen, H.V., Berenschot, J.W., Bennink, M.L., ...
We have developed a micromachined flow cell consisting of a flow channel integrated with micropipettes. The flow cell is used in combination with an optical trap setup (optical tweezers) to study...
Zwijze, A.F., Wiegerink, R.J., Krijnen, G.J.M., Berenschot, J.W., Boer De, M.J., Elwenspoek, M.C.
A 10kN silicon force sensor is realized in which the force is measured by compressing a meander shaped polysilicon strain gage. A second gage which is not loaded, is used for temperature...
Fabrication of micromachined pipettes in a flow channel for single molecule handling of DNA (2000)
Rusu, C.R., Boer De, M.J., Jansen, H.V., Berenschot, J.W., Bennink, M.L., ...
We have developed a micromachined flow cell consisting of a flow channel integrated with micropipettes. The flow cell is used in combination with an optical trap set-up (optical tweezers) to study...
Micromachining of buried micro channels in silicon (2000)
Boer De, M.J., Tjerkstra, R.W., Berenschot, J.W., Jansen, H.V., Burger, G.J., Gardeniers, J.G.E., ...
A new method for the fabrication of micro structures for fluidic applications, such as channels, cavities, and connector holes in the bulk of silicon wafers, called buried channel technology (BCT),...
Wet and dry etching techniques for the release of submicron perforated membranes (1999)
Kuiper, S., Boer De, M.J., Nijdam, W., Krijnen, G.J.M., Elwenspoek, M.C.
First micromachined silicon load cell for loads up to 1000 kg (1998)
Wensink, H., Boer De, M.J., Wiegerink, R.J., Zwijze, R.A.F., Elwenspoek, M.C.
In this paper, a bulk micromachined silicon load cell is presented, designed for loads up to 1000 kg. ANSYS simulations were used to determine the load cell dimensions and strain gauge positions. The...
Design and realisation of a quasi monolithic silicon load cell (1998)
Wensink, H., Wiegerink, R.J., Zwijze, A.F., Boer De, M.J., Elwenspoek, M.C.
Braber Den, E.T., Jansen, H.V., Boer De, M.J., Croes, H.J.E., Elwenspoek, M., Ginsel, L.A., ...
During this study, microtechnology and plasma etching were used to produce gratings 1.0 (TiD01), 2.0 (TiD02), 5.0 (TiD05), and 10.0 m wide (TiD10) into commercially pure titanium wafers. After...
Etching technology for microchannels (1997)
Tjerkstra, R.W., Boer De, M.J., Berenschot, J.W., Gardeniers, J.G.E., Elwenspoek, M.C.
Various ways of fabricating channels in silicon are discussed. Some new channels are presented: the GPSICs and the LPCVD covered channels. Also some attention is paid to the problem of making...
RIE lag in high aspect ratio trench etching of silicon (1997)
Jansen, H.V., Boer De, M.J., Wiegerink, R.J., Tas, N.R., Smulders, E.J.T., Rusu, C.R., ...
While etching high 3 aspect ratio trenches into silicon with reactive ion etching (RIE) using an SF6/O2 chemistry it is observed that the etch rate is depending on the mask opening. This effect is...
Etching technology for chromatography microchannels (1997)
Tjerkstra, R.W., Boer De, M.J., Berenschot, J.W., Gardeniers, J.G.E., Elwenspoek, M.C.
Half-circular channels, to be used for gas chromatography, were etched isotropically using a mixture of HF, HNO3 and H2O. Two wafers with half-circular channels were bonded on top of each other to...
Microfabrication of near-field optical probes (1996)
Ruiter, A.G.T., Moers, M.H.P., Hulst Van, N.F., Boer De, M.J.
Near-field optical microscopy generally uses a tapered optical fiber, which is metal coated, to form a sub-wavelength sized light source. Here, a technique for the fabrication of a new type of probe...
The black silicon method VI: high aspect ratio treck etching for MEMS applications (1996)
Jansen, H.V., Boer De, M.J., Elwenspoek, M.C.
Etching high aspect ratio trenches (HARTs) in silicon is becoming increasingly important for MEMS applications. Currently, the most important technique is dry reactive ion etching (RIE). This paper...
A survey on the reactive ion etching of silicon in microtechnology (1996)
Jansen, H.V., Gardeniers, J.G.E., Boer De, M.J., Elwenspoek, M.C., Fluitman, J.H.J.
This article is a brief review of dry etching as applied to pattern transfer, primarily in silicon technology. It focuses on concepts and topics for etching materials of interest in micromechanics....
Anisotropic reactive ion etching of silicon using SF6/O2/CHF3 gas mixtures (1995)
Legtenberg, R., Jansen, H.V., Boer De, M.J., Elwenspoek, M.C.
Boer De, M.J., Jansen, H.V., Elwenspoek, M.C.
This paper presents a study of various well-known release techniques (bulk- and surface-micromachining) for the fabrication of movable silicon micromechanical structures. Their pro¿s and con¿s will...
Jansen, H.V., Boer De, M.J., Legtenberg, R., Elwenspoek, M.C.
Very deep trenches (up to 200 mu m) with high aspect ratios (up to 10) in silicon and polymers are etched using a fluorine-based plasma (SF6/O2/CHF3). Isotropic, positively and negatively (i.e....
Jansen, H.V., Boer De, M.J., Burger, J.F., Legtenberg, R., Elwenspoek, M.C.
Very deep trenches in Si with smooth controllable profiles are etched using a fluorine-based Reactive Ion Etcher(RIE). The effect of various mask materials and loading on the profile is examined...
Anisotropic reactive ion etching of silicon using SF6/02/CHF3 gas mixtures (1995)
Legtenberg, R., Jansen, H.V., Boer De, M.J., Elwenspoek, M.C.