Branger, V., Durand, N., Haghiri-Gosnet, A., Badawi, K., Ravet, M.
Cet article concerne l'étude des propriétés mécaniques et microstructurales de films minces de tungstène (700 nm sur Si (100)) élaborés par pulvérisation magnétron en fonction de la...
Branger, V., Durand, N., Haghiri-Gosnet, A., Badawi, K., Ravet, M.
Cet article concerne l'étude des propriétés mécaniques et microstructurales de films minces de tungstène (700 nm sur Si (100)) élaborés par pulvérisation magnétron en fonction de la...
Branger, V., Durand, N., Haghiri-Gosnet, A., Badawi, K., Ravet, M.
Cet article concerne l'étude des propriétés mécaniques et microstructurales de films minces de tungstène (700 nm sur Si (100)) élaborés par pulvérisation magnétron en fonction de la...
Deep etch lithography at LURE-D.C.I. storage ring (1994)
Megtert, S., Labèque, A., Zewen, Liu, Dexpert, H., Comès, R., Rousseaux, F., ...
LIGA technique has proved to be a powerful tool for micro-fabrication mass production. French laboratories (LURE, L2M, LPMO) gathered to introduce this new technology at LURE facilities. In this...
X-ray lithography : an overview and recent activities at super-ACO (1994)
Rousseaux, F., Haghiri-Gosnet, A., Chen, Y., Ravet, M., Launois, H.
In this paper, the current status of synchrotron based XRL is discussed in view to present this technic as an alternative path to ultra-large-scale-integrated circuit (ULSI) with feature sizes of...
Deep etch lithography at LURE-D.C.I. storage ring (1994)
Megtert, S., Labèque, A., Zewen, Liu, Dexpert, H., Comès, R., Rousseaux, F., ...
LIGA technique has proved to be a powerful tool for micro-fabrication mass production. French laboratories (LURE, L2M, LPMO) gathered to introduce this new technology at LURE facilities. In this...
X-ray lithography : an overview and recent activities at super-ACO (1994)
Rousseaux, F., Haghiri-Gosnet, A., Chen, Y., Ravet, M., Launois, H.
In this paper, the current status of synchrotron based XRL is discussed in view to present this technic as an alternative path to ultra-large-scale-integrated circuit (ULSI) with feature sizes of...
Deep etch lithography at LURE-D.C.I. storage ring (1994)
Megtert, S., Labèque, A., Zewen, Liu, Dexpert, H., Comès, R., Rousseaux, F., ...
LIGA technique has proved to be a powerful tool for micro-fabrication mass production. French laboratories (LURE, L2M, LPMO) gathered to introduce this new technology at LURE facilities. In this...
X-ray lithography : an overview and recent activities at super-ACO (1994)
Rousseaux, F., Haghiri-Gosnet, A., Chen, Y., Ravet, M., Launois, H.
In this paper, the current status of synchrotron based XRL is discussed in view to present this technic as an alternative path to ultra-large-scale-integrated circuit (ULSI) with feature sizes of...
Maurer, M., Gourieux, T., Krill, G., Ravet, M., Tolentino, H., Fontaine, A.
X-ray photoemission (XPS) and X-ray absorption (XAS) have been performed on YBa2Cu3O7-∂ ceramics as a function of ∂ (0.1 < ∂ < 0.7). The results show the modifications of the Cu...
Maurer, M., Gourieux, T., Krill, G., Ravet, M., Tolentino, H., Fontaine, A.
X-ray photoemission (XPS) and X-ray absorption (XAS) have been performed on YBa2Cu3O7-∂ ceramics as a function of ∂ (0.1 < ∂ < 0.7). The results show the modifications of the Cu...
Maurer, M., Gourieux, T., Krill, G., Ravet, M., Tolentino, H., Fontaine, A.
X-ray photoemission (XPS) and X-ray absorption (XAS) have been performed on YBa2Cu3O7-∂ ceramics as a function of ∂ (0.1 < ∂ < 0.7). The results show the modifications of the Cu...
ATOMIC RELAXATION IN MIXED-VALENT SYSTEMS DEDUCED FROM EXAFS SPECTROSCOPY (1986)
Wetta, N., Krill, G., Haen, P., Lapierre, F., Ravet, M., Godart, C., ...
We will present how it is possible, from EXAFS spectroscopy, to estimate atomic relaxation effects even in homogeneous mixed valent compounds, for which these relaxations are known to be very small....
ATOMIC RELAXATION IN MIXED-VALENT SYSTEMS DEDUCED FROM EXAFS SPECTROSCOPY (1986)
Wetta, N., Krill, G., Haen, P., Lapierre, F., Ravet, M., Godart, C., ...
We will present how it is possible, from EXAFS spectroscopy, to estimate atomic relaxation effects even in homogeneous mixed valent compounds, for which these relaxations are known to be very small....
ATOMIC RELAXATION IN MIXED-VALENT SYSTEMS DEDUCED FROM EXAFS SPECTROSCOPY (1986)
Wetta, N., Krill, G., Haen, P., Lapierre, F., Ravet, M., Godart, C., ...
We will present how it is possible, from EXAFS spectroscopy, to estimate atomic relaxation effects even in homogeneous mixed valent compounds, for which these relaxations are known to be very small....