One-Step Patterning of Asymmetric Gate Recess for InP HEMTs using Genetic Algorithms (2008)
Franck Robin, Andrea Orzati, Esteban Moreno, Michael Spühler, Otte Homan, Werner Bächtold
For the first time, a canonical genetic algorithm was used to optimize the resist profiles for T-gate fabrication. An e-beam lithography simulation tool was elaborated that calculates the...