P. Verheyen

Publication List Details

Period

1981 - 2007

Number

18

Co-Authors

Leakage current control in recessed SiGe Source/Drain junctions (2007)

Gonzalez, M. Bargallo, Verheyen, P, Bender, H, Schreutelkamp, R, ...

The impact of different process parameters, namely, the trench etch depth, the total epitaxial SiGe thickness, and the epi elevation, on the leakage current of recessed Si0.8Ge0.2 source/drain...

pMOSFET with 200% mobility enhancement induced by multiple stressors (2006)

Nouri, F, Thirupapuliyur, S, Verheyen, P, Moroz, V, ...

Recessed Si0.8Ge0.2 source/drain (S/D) and a compressive contact etch-stop layer have been successfully integrated resulting in nearly 200% improvement in hole mobility. This is the largest reported...

The future of high-K on pure germanium and its importance for GeCMOS (2005)

Delabie, A, Van Elshocht, S, Kubicek, S, Verheyen, P, De Jaeger, B, ...

A comparison between atomic layer chemical vapor deposition (ALCVD) and metal organic chemical vapor deposition (MOCVD) HfO2 layers on Ge indicate that ALCVD layers have some improved capacitor...