Rastogi, R S, Vankar, V D, Chopra, K L
Thin films of MoSix (with and without oxygen) were deposited by co-sputtering of molybdenum and silicon targets. As-deposited films were annealed in argon environment in the temperature range...
Interaction of Mo/Ni and Mo/Co bilayer structures with silicon (1991)
Rastogi, R S, Vankar, V D, Chopra, K L
The thin film interaction of Mo/Ni and Mo/Co bilayer structures was investigated in the temperature range 500–650 °C by Auger electron spectroscopy and glancing angle X-ray diffraction. It was...