Donahue, Megan, Ming, Sun, O'Dea, Christopher, Voit, G. Mark, Cavagnolo, Kenneth
Also archived in: arXiv:0705.1659 v1 May 11 2007
Liu Yuling, Wang Juan, Sun Ming, Liu Chenglin
Both process and mechanical of silicon substrate chemical mechanical polishing (CMP) are studied in detail, and the effects of experiments designed indicate that nano-SiO2 grinding particles seem to...
Huang Junyan, Guo Suxia, Mahillon Jacques, Wang Li, Han Dongmei, ...
Abstract Background Bacillus thuringiensis belongs to the Bacillus cereus sensu lato group of Gram-positive and spore-forming bacteria. Most isolates of B. thuringiensis can bear many endogenous...
Liu Yuling, Wang Juan, Sun Ming, Liu Chenglin
Both process and mechanical of silicon substrate chemical mechanical polishing (CMP) are studied in detail, and the effects of experiments designed indicate that nano-SiO2 grinding particles seem to...